Scattering center determination for integrated antenna measurements at mm-wave frequencies

In this paper the results of integrated antenna measurements are analyzed to identify the main reflection locations when measuring with wafer probes. Two different approaches are described and the measurement results for two different probe designs are shown. First, the main reflection center on the wafer probe is determined by analyzing the measured far field radiation pattern at 160 GHz. The second approach is based on an extrapolation measurement of the antenna. It is shown that the reflective areas can be identified for both probe designs. The results can be used to assess the measurement uncertainty and to quantify the measurement error.

[1]  Zuo-Min Tsai,et al.  A V-Band On-Wafer Near-Field Antenna Measurement System Using an IC Probe Station , 2013, IEEE Transactions on Antennas and Propagation.

[2]  A. B. Smolders,et al.  The Influence of the Probe Connection on mm-Wave Antenna Measurements , 2015, IEEE Transactions on Antennas and Propagation.

[3]  Christian Waldschmidt,et al.  Accuracy evaluation for antenna measurements at mm-wave frequencies , 2016, 2016 10th European Conference on Antennas and Propagation (EuCAP).

[4]  M. D. Huang,et al.  Disturbing effects of microwave probe on mm-Wave antenna pattern measurements , 2014, The 8th European Conference on Antennas and Propagation (EuCAP 2014).

[5]  Edward Szpindor,et al.  Mitigating Effects of Interference in On-Chip Antenna Measurements , 2015 .

[6]  Christian Waldschmidt,et al.  Probe influence on integrated antenna measurements at frequencies above 100 GHz , 2016, 2016 46th European Microwave Conference (EuMC).

[7]  Ronald Dekker,et al.  Silicon-Filled Rectangular Waveguides and Frequency Scanning Antennas for mm-Wave Integrated Systems , 2013, IEEE Transactions on Antennas and Propagation.

[8]  Christian Waldschmidt,et al.  Robotically controlled directivity and gain measurements of integrated antennas at 280 GHz , 2015, 2015 European Microwave Conference (EuMC).