Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories
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Christoph Adelmann | Thomas Mikolajick | Uwe Schroeder | Tony Schenk | S. Mueller | R. Materlik | A. Kersch | M. Popovici | S. Van Elshocht | C. Adelmann | M. Popovici | T. Mikolajick | A. Kersch | U. Schroeder | S. Mueller | S. Elshocht | T. Schenk | Sven Van Elshocht | Robin Materlik | Alfred Kersch
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