论文信息 - Three-dimensional femtosecond photochemical etching in silicon - 字舞流文

Three-dimensional femtosecond photochemical etching in silicon

Micron-size channels have been made inside silicon by femtosecond laser-assisted HF etching. The etching is guided by localized carriers generated via two-photon absorption. Its potential of 3-D drilling has been demonstrated.

Huimin Ouyang | Yujun Deng | P.M. Fauchet | W.H. Knox

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