A Two-Step Wet Etch Process for the Facile Fabrication of Hybrid Micro-Nanofluidic Devices

Hybrid microfluidic and nanofluidic devices have recently been developed for a variety of applications including water desalination, molecular gates, and other lab-on-chip uses. In this paper, we report on a 2-step wet etch process to fabricate hybrid microfluidic and nanofluidic devices with controllable features including a sloped nanochannel. The nanochannels with slit-like geometry can be fabricated with dimensions as small as 50 nm depth and a width of 30 μm for a minimum aspect ratio of 0.002. The channels are several cm long.Copyright © 2011 by ASME