Variability in nanometer CMOS: Impact, analysis, and minimization

Variation is a significant concern in nanometer-scale CMOS due to manufacturing equipment being pushed to fundamental limits, particularly in lithography. In this paper, we review recent work in coping with variation, through both improved analysis and optimization. We describe techniques based on integrated circuit manufacturing, circuit design strategies, and mathematics and statistics. We then go on to discuss trends in this area, and a future technology outlook with an eye towards circuit and CAD-solutions to growing levels of variation in underlying device technologies.

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