New methodologies: Development of focus monitoring on product
暂无分享,去创建一个
Christian Sparka | Xueli Hao | Juan-Manuel Gomez | Pradeep Subrahmanyan | Vidya Ramanathan | Janay Camp | Pedro Herrera | Fang Fang | Young Ki Kim | Dimitry Sanko | Sanjay Kapasi | Zhou Ren | Markus Mengel | Stilian Ivanov Pandev
[1] Jeong Soo Kim,et al. Lithography focus/exposure control and corrections to improve CDU at post etch step , 2014, Advanced Lithography.
[2] Christopher P. Ausschnitt,et al. Focus and dose characterization of immersion photoclusters , 2009, Advanced Lithography.
[3] Alok Vaid,et al. Signal response metrology (SRM): a new approach for lithography metrology , 2015, Advanced Lithography.
[4] Ye Tian,et al. Focus control enhancement and on-product focus response analysis methodology , 2016, SPIE Advanced Lithography.