Gate length scaling accelerated to 30 nm regime using ultra-thin film PD-SOI technology
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Woo-Hyeong Lee | S.K.H. Fung | P. Agnello | A. Ajmera | J. Welser | M. Khare | B. Doris | D. Schepis | M. Khare | D. Schepis | P. Agnello | K. Muller | J. Welser | A. Ajmera | S. Fung | B. Doris | Woo-Hyeong Lee | H. Park | J. Snare | P. Gilbert | K.P. Muller | P. Gilbert | S. Ku | H. Park | Suk Hoon Ku | J. Snare