论文信息 - Post-deposition oxygen plasma treatment of a-Si:H - 字舞流文

Post-deposition oxygen plasma treatment of a-Si:H

[1] P. Danesh,et al. Field-assisted ion exchange for the detection of localized defects in thin films on glass substrates , 1988 .

[2] Winer,et al. Effects of oxidation on surface band-gap states in a-Si:H. , 1988, Physical Review B (Condensed Matter).

[3] P. Danesh,et al. Revelation of micropores in a-Si:H films , 1988 .

[4] Cohen,et al. Observtion of an oxygen-related mobility-gap defect in ion-implanted hydrogenated amorphous silicon films. , 1987, Physical Review B (Condensed Matter).

[5] G. Velasco,et al. Hydrogenation of evaporated amorphous silicon films by plasma treatment , 1978 .

[6] R. Street,et al. Luminescence studies of plasma-deposited hydrogenated silicon , 1978 .

[7] J. Pankove. Photoluminescence recovery in rehydrogenated amorphous silicon , 1978 .