Real-time statistical process control using tool data (semiconductor manufacturing)

A process monitoring scheme that takes advantage of real-time information in order to generate malfunction alarms is described. This is accomplished with the application of time-series filtering and multivariate statistical process control. This scheme is capable of generating alarms on a true real-time basis, while the wafer is still in the processing chamber. Several examples are presented with tool data collected from the SECSII port of single-wafer plasma etchers. >

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