Critical dimension uniformity characterization of nanoimprinted trenches for high volume manufacturing qualification
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H. Teyssedre | L. Pain | S. Landis | M. Eibelhuber | M. Wimplinger | S. Bos | C. Thanner | M. Laure | W. Zorbach | V. Schauer | M. Wimplinger | L. Pain | S. Landis | H. Teyssèdre | V. Schauer | M. Eibelhuber | C. Thanner | M. Laure | W. Zorbach | S. Bos
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