Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ZrO2 film as gate dielectric with improved reliability
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Fu-Hsiang Ko | Jagan Singh Meena | Min-Ching Chu | Hsin-Chiang You | Chih-Chia Cheng | Feng-Chih Chang | Chih-Chia Cheng | F. Chang | F. Ko | J. Meena | H. You | Min-Ching Chu
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