Study of preferential localized degradation and breakdown of HfO2/SiOx dielectric stacks at grain boundary sites of polycrystalline HfO2 dielectrics
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Nagarajan Raghavan | Michel Bosman | Kin Leong Pey | Sunil Singh Kushvaha | K. Shubhakar | Sean J. O’Shea | K. Pey | N. Raghavan | M. Bosman | S. O’Shea | K. Shubhakar | S. S. Kushvaha | Zhongrui Wang | Zhongrui Wang
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