论文信息 - Cost-Effective Low $V_{t}$ Ni-FUSI CMOS on SiON by Means of Al Implant (pMOS) and $\hbox{Yb}{+}\hbox{P}$ Coimplant (nMOS) - 字舞流文

Cost-Effective Low $V_{t}$ Ni-FUSI CMOS on SiON by Means of Al Implant (pMOS) and $\hbox{Yb}{+}\hbox{P}$ Coimplant (nMOS)

A. Veloso | J. Kittl | A. Lauwers | H. Yu | T. Hoffmann | P. Absil | S. Chang | M. Demand | S. Biesemans | W. Vandervorst | S. Mertens | C. Kerner | C. Vrancken | R. Mitsuhashi | M. Ameen | M. Niwa | C. Demeurisse | A. Rothschild | M. Pawlak | I. Satoru | G. Whittemore