An Adaptive-Tuning Scheme for G&P EWMA Run-to-Run Control

Run-to-run (RtR) control is an important method for improving process capability. The most common form of RtR controllers are exponentially weighted moving average (EWMA) controllers. The performance of EWMA RtR controllers is affected by the values of the selected tuning parameter. In practice, the tuning parameter usually remains unchanged, resulting in suboptimal performance. In this paper, we propose an adaptive-tuning method for a group and product (G&P) EWMA controller to improve the control performance. The G&P EWMA controller is developed for mixed run processes. We show that the optimum-tuning parameters for the next run of this G&P EWMA controller are obtained online using a window of historical input-output data. The performance improvement due to the proposed method is demonstrated by a simulation example and an industrial application.

[1]  David Shan-Hill Wong,et al.  Mixed product run-to-run process control – An ANOVA model with ARIMA disturbance approach , 2009 .

[2]  T. Edgar,et al.  Performance Assessment of Run-to-Run EWMA Controllers , 2007 .

[3]  Enrique del Castillo,et al.  Closed-Loop Disturbance Identification and Controller Tuning for Discrete Manufacturing Processes , 2002, Technometrics.

[4]  Duane S. Boning,et al.  A self-tuning EWMA controller utilizing artificial neural network function approximation techniques , 1996, Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium.

[5]  Jin Wang,et al.  Stability analysis and optimal tuning of EWMA controllers – Gain adaptation vs. intercept adaptation , 2010 .

[6]  Fugee Tsung,et al.  A study of variable EWMA controller , 2003 .

[7]  Arnon M. Hurwitz,et al.  Run-to-Run Process Control: Literature Review and Extensions , 1997 .

[8]  Thomas F. Edgar,et al.  PID control performance assessment: The single‐loop case , 2004 .

[9]  David Shan-Hill Wong,et al.  Threaded EWMA Controller Tuning and Performance Evaluation in a High-Mixed System , 2009 .

[10]  Costas J. Spanos,et al.  Fundamentals of Semiconductor Manufacturing and Process Control: May/Fundamentals of Semiconductor Manufacturing and Process Control , 2006 .

[11]  W. J. Campbell,et al.  Just-in-time adaptive disturbance estimation for run-to-run control of semiconductor processes , 2006, IEEE Transactions on Semiconductor Manufacturing.

[12]  Detlef Pabst,et al.  Compensating for the Initialization and Sampling of EWMA Run-to-Run Controlled Processes , 2010, IEEE Transactions on Semiconductor Manufacturing.

[13]  Tianhong Pan,et al.  A G&P EWMA algorithm for high-mix semiconductor manufacturing processes , 2011 .

[14]  Armann Ingolfsson,et al.  Stability and Sensitivity of an EWMA Controller , 1993 .

[15]  David Shan-Hill Wong,et al.  Identification of tool and product effects in a mixed product and parallel tool environment , 2009 .

[16]  Enrique Del Castillo,et al.  Some Properties of EWMA Feedback Quality Adjustment Schemes for Drifting Disturbances , 2001 .

[17]  Shuqing Wang,et al.  Performance assessment of run-to-run control in semiconductor manufacturing based on IMC framework , 2009 .

[18]  C.-C. Hsu,et al.  On-line tuning of a single EWMA controller based on the neural technique , 2004 .

[19]  David C. Drain Run-to-Run Control in Semiconductor Manufacturing , 2002 .

[20]  Costas J. Spanos,et al.  Fundamentals of Semiconductor Manufacturing and Process Control , 2006 .

[21]  T. Harris Assessment of Control Loop Performance , 1989 .

[22]  Thomas F. Edgar,et al.  A new state estimation method for high-mix semiconductor manufacturing processes , 2009 .

[23]  Bengt Klefsjö,et al.  Statistical process adjustment for quality control , 2003 .

[24]  N. Patel,et al.  Adaptive optimization of run-to-run controllers: the EWMA example , 2000 .