Effects of electrical leakage currents on MEMS reliability and performance

Electrostatically driven MEMS devices commonly operate with electric fields as high at 10/sup 8/ V/m applied across the dielectric between electrodes. Even with the best mechanical design, the electrical design of these devices has a large impact both on performance (e.g., speed and stability) and on reliability (e.g., corrosion and dielectric or gas breakdown). In this paper, we discuss the reliability and performance implications of leakage currents in the bulk and on the surface of the dielectric insulating the drive (or sense) electrodes from one another. Anodic oxidation of poly-silicon electrodes can occur very rapidly in samples that are not hermetically packaged. The accelerating factors are presented along with an efficient early-warning scheme. The relationship between leakage currents and the accumulation of quasistatic charge in dielectrics are discussed, along with several techniques to mitigate charging and the associated drift in electrostatically actuated or sensed MEMS devices. Two key parameters are shown to be the electrode geometry and the conductivity of the dielectric. Electrical breakdown in submicron gaps is presented as a function of packaging gas and electrode spacing. We discuss the tradeoffs involved in choosing gap geometries and dielectric properties that balance performance and reliability.

[1]  Jeremy A. Walraven,et al.  MEMS Reliability: Infrastructure, Test Structures, Experiments, and Failure Modes , 2000 .

[2]  H. Lewerenz,et al.  Anodic oxides on silicon , 1992 .

[3]  S. Arney Designing for MEMS Reliability , 2001 .

[4]  Milton Ohring,et al.  Reliability and Failure of Electronic Materials and Devices, Second Edition , 1998 .

[5]  J. Jason Yao,et al.  RF MEMS from a device perspective , 2000 .

[6]  W. Merlijn van Spengen,et al.  MEMS reliability from a failure mechanisms perspective , 2003, Microelectron. Reliab..

[7]  G. Perregaux,et al.  Arrays of addressable high-speed optical microshutters , 2001, Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090).

[8]  Herbert Shea,et al.  Drift-Free, 1000 G mechanical shock tolerant single-crystal silicon two-axis MEMS tilting mirrors in a 1000/spl times/1000-port optical crossconnect , 2003, OFC 2003 Optical Fiber Communications Conference, 2003..

[9]  Larry Levit,et al.  Electrical breakdown and ESD phenomena for devices with nanometer-to-micron gaps , 2003, SPIE MOEMS-MEMS.

[10]  Jean-Philippe Polizzi,et al.  Lifetime characterization of capacitive RF MEMS switches , 2005, SPIE MOEMS-MEMS.

[11]  J.J. Shea,et al.  High voltage engineering, 2nd Ed. , 2000, IEEE Electrical Insulation Magazine.

[12]  John Crank,et al.  The Mathematics Of Diffusion , 1956 .

[13]  Susanne Arney,et al.  Anodic oxidation and reliability of MEMS polysilicon electrodes at high relative humidity and high voltages , 2000, SPIE MOEMS-MEMS.

[14]  Michael Hietschold,et al.  Parasitic charging of dielectric surfaces in capacitive microelectromechanical systems (MEMS) , 1998 .

[15]  B. Stark MEMS Reliability Assurance Guidelines for Space Applications , 1999 .

[16]  D. Kauzlarick,et al.  Fundamentals of microfabrication, the science of miniaturization, 2nd edition [Book Review] , 2003, IEEE Engineering in Medicine and Biology Magazine.

[17]  C. Nuzman,et al.  1100 x 1100 port MEMS-based optical crossconnect with 4-dB maximum loss , 2003, IEEE Photonics Technology Letters.

[18]  Masayoshi Esashi,et al.  Imaging of micro-discharge in a micro-gap of electrostatic actuator , 2000, Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308).

[19]  R. Dutton,et al.  Characterization of contact electromechanics through capacitance-voltage measurements and simulations , 1999 .

[20]  M. Madou Fundamentals of microfabrication : the science of miniaturization , 2002 .

[21]  Jeremy A. Walraven,et al.  Electrostatic discharge/electrical overstress susceptibility in MEMS: a new failure mode , 2000, SPIE MOEMS-MEMS.

[22]  Jeremy A. Walraven,et al.  Anodic oxidation-induced delamination of the SUMMiT poly 0 to Silicon Nitride Interface , 2003, SPIE MOEMS-MEMS.