Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer
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Vito Rutigliani | Frieda Van Roey | Evangelos Gogolides | Vassilios Constantoudis | George Papavieros | Gian Lorusso | G. Lorusso | V. Rutigliani | G. Papavieros | E. Gogolides | V. Constantoudis | F. van Roey
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