レーザー加熱によるPZT膜配向性制御と膜評価;レーザー加熱によるPZT膜配向性制御と膜評価;Orientation Control and Properties of PZT Film Crystalized using Laser Annealing System
暂无分享,去创建一个
Kazuhiro Koga | Fumito Imura | Sommawan Khumpuang | Daiji Noda | Shiro Hara | Junko Kazusa | Norio Umeyama | Junko Kazusa | Kazuhiro Koga | Norio Umeyama | Fumito Imura | Daiji Noda | Sommawan Khumpuang | Shiro Hara
[1] I-Wei Chen,et al. Comparative Role of Metal-Organic Decomposition-Derived [100] and [111] in Electrical Properties of Pb(Zr, Ti)O3 Thin Films , 1997 .
[2] Sung Tae Kim,et al. Study on Microstructures and Interdiffusion Behavior in Pt/Ti/SiO2/Si and Pb(Zr, Ti)O3/Pt/Ti/SiO2/Si Multilayer Systems , 1995 .
[3] Jochen Stollenwerk,et al. Fabrication of Multilayer Pb(Zr0.53Ti0.47)O3Film Crystallized by Laser Annealing , 2013 .
[4] H. Maekawa,et al. Photolithography for Minimal Fab System , 2013 .
[5] Yoshihiro Tomita,et al. Preparation of epitaxial Pb(ZrxTi1−x)O3 thin films and their crystallographic, pyroelectric, and ferroelectric properties , 1989 .
[6] K. Uchino,et al. Crystal orientation dependence of piezoelectric properties of lead zirconate titanate near the morphotropic phase boundary , 1998 .
[7] C. J. Kim,et al. Investigation of the drying temperature dependence of the orientation in sol–gel processed PZT thin films , 1997 .
[8] Jeong-Suong Yang,et al. Dielectric and Electromechanical Properties of Pb(Zr,Ti)O3 Thin Films for Piezo-Microelectromechanical System Devices , 2003 .
[9] I-Wei Chen,et al. Texture Development, Microstructure Evolution, and Crystallization of Chemically Derived PZT Thin Films , 2005 .
[10] David A. Payne,et al. Preferred Orientations for Sol-Gel Derived Plzt Thin Layers , 1993 .
[11] Ryutaro Maeda,et al. Effect of multi-coating process on the orientation and microstructure of lead zirconate titanate (PZT) thin films derived by chemical solution deposition , 2005 .
[12] Keunjoo Kim. Positron Annihilation Lifetimes from F-Center Related Bound States of Alkali Halides , 1995 .
[13] Sommawan Khumpuang,et al. A MOSFET Fabrication Using a Maskless Lithography System in Clean-Localized Environment of Minimal Fab , 2015, IEEE Transactions on Semiconductor Manufacturing.