3D fabrication by moving mask deep X-ray lithography (M/sup 2/DXL) with multiple stages

The final goal of this study is to establish a technology to realize 3-dimensional (3D) microstructures with free shaped walls by synchrotron radiation deep X-ray lithography. In this paper, we present two important advances toward this goal. A reverse approach using the Fourier transform technique to define the optimum X-ray mask movement pattern is improved and applied to V-grooved microstructure fabrication. A new X-ray exposure system that combines the moving mask deep X-ray lithography technique (M/sup 2/DXL) and multiple stages is developed and the system performance confirmed.