Selective growth of fully relaxed GeSn nano-islands by nanoheteroepitaxy on patterned Si(001)
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G. Capellini | N. Taoka | P. Zaumseil | H. Känel | T. Schroeder | Yuji Yamamoto | M. Schubert | G. Niu | O. Skibitzki | W. Klesse | V. Schlykow | M. Barget | Y. Yamamoto