Photoetchable glass for microsystems: tips for atomic force microscopy

The authors present the use of photoetchable glasses in the field of microsystem technology. Its properties make it an ideal material for a wide variety of microsystems. A method to fabricate tips for atomic force microscopy out of this material is proposed. The main advantage of these tips with respect to conventional silicon-based tips is their large aspect ratio. Silicon nitride is used as a material for the cantilevers, which are on top of a glass carrier. Experimental results are presented.