Electron beam lithography simulation for mask making

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single ''pixel'' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a simulated three-dimensional resist pattern.