Real-time spatial control of photoresist development rate
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Arthur Tay | Weng Khuen Ho | Kuen-Yu Tsai | Ni Hu | Choon-Meng Kiew | W. Ho | K. Tsai | A. Tay | C. Kiew | Ni Hu
[1] C. Spanos,et al. A novel in-line automated metrology for photolithography , 1996 .
[2] Patrick Jean Paniez,et al. Bake mechanisms in novolak-based photoresist films: investigation by contact angle measurements , 1996, Advanced Lithography.
[3] Patrick Jean Paniez,et al. Study of bake mechanisms by real-time in-situ ellipsometry , 1998, Advanced Lithography.
[4] Christopher A. Bode,et al. Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities , 2000, Autom..
[5] T. Kailath,et al. Control systems for the nanolithography process , 1999, Proceedings of the 38th IEEE Conference on Decision and Control (Cat. No.99CH36304).
[6] C. G. Willson,et al. Introduction to microlithography , 1994 .
[7] Arthur Tay,et al. Real-time control of photoresist development process , 2005, SPIE Advanced Lithography.
[8] H. O. Simmons,et al. In-situ film thickness measurements for real-time monitoring and control of advanced photoresist track coating systems , 1992, Other Conferences.
[9] Butrus T. Khuri-Yakub,et al. Ultrasonic sensor for photoresist process monitoring , 1999 .