论文信息 - Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors - 字舞流文

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

Jun Yu Li | W. Kessels | P. Lemaire | A. Mameli | D. Hausmann | A. Mackus | Kashish Sharma | M. Merkx | T. Sandoval | Athanasios Angelidis