Plasma-enhanced chemical vapour deposition of microcrystalline silicon: On the dynamics of the amorphous-microcrystalline interface by optical methods
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M. Gemmi | E. Centurioni | R. Rizzoli | F. Zignani | G. Bruno | M. Losurdo | P. Capezzuto | C. Summonte | G. Bruno | R. Pinghini | A. Desalvo