Improving yield, accuracy and complexity in surface tension self-assembled MOEMS

Abstract An advanced process for self-assembly of three-dimensional micro-opto-mechanical systems (MOEMS) is demonstrated, based on deep reactive ion etching of bonded silicon-on-insulator material, sacrificial etching, and out-of plane rotation powered by the surface tension of thick photoresist pads. Improvements in structure definition and design are described, which have led to an increase in process yield to approximately 75% and in the best assembly accuracy to

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