Experimental validation of stochastic modeling for negative-tone develop EUV resists
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Geert Vandenberghe | Danilo De Simone | Eric Hendrickx | Kevin Lucas | Wolfgang Demmerle | Thomas Schmöller | Ulrich Klostermann | Weimin Gao | Itaru Kamohara
[1] Peter De Bisschop,et al. Experimental validation of rigorous, 3D profile models for negative-tone develop resists , 2014, Advanced Lithography.
[2] Wataru Shibayama,et al. EUV sensitive Si containing hard mask (Si-HM) for PTD and NTD process in EUVL , 2013, Advanced Lithography.