Towards a Ge-based laser for CMOS applications
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J. Michel | Xiaochen Sun | P. Becla | J. Michel | L. Kimerling | Jifeng Liu | X. Sun | P. Becla | L.C. Kimerling | Jifeng Liu
[1] M. Morse,et al. 31 GHz Ge n-i-p waveguide photodetectors on Silicon-on-Insulator substrate. , 2007, Optics express.
[2] Yasuhiko Ishikawa,et al. Strain-induced band gap shrinkage in Ge grown on Si substrate , 2003 .
[3] B. Jalali,et al. Silicon Photonics , 2006, Journal of Lightwave Technology.
[4] Andrew G. Glen,et al. APPL , 2001 .
[5] Jurgen Michel,et al. High performance, waveguide integrated Ge photodetectors. , 2007, Optics express.
[6] Yasuhiko Ishikawa,et al. Deformation potential constants of biaxially tensile stressed Ge epitaxial films on Si ( 100 ) , 2004 .
[7] Jurgen Michel,et al. Tensile-strained, n-type Ge as a gain medium for monolithic laser integration on Si. , 2007, Optics express.
[8] D. Ahn,et al. Electronic-photonic integrated circuits on the CMOS platform , 2006, SPIE OPTO.
[9] Kazumi Wada,et al. High-quality Ge epilayers on Si with low threading-dislocation densities , 1999 .
[10] David A B Miller,et al. Optical modulator on silicon employing germanium quantum wells. , 2007, Optics express.
[11] G. G. Stokes. "J." , 1890, The New Yale Book of Quotations.