SiyGe1−x−ySnx films grown on Si using a cold-wall ultrahigh-vacuum chemical vapor deposition system
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R. Soref | A. Mosleh | S. Al-Kabi | S. Ghetmiri | W. Du | H. Naseem | Shui-Qing Yu | W. Dou | Baohua Li | P. Grant | Larry C. Cousar | M. Alher | G. Sun