论文信息 - Test structures for evaluating strong phase shift lithography

Test structures for evaluating strong phase shift lithography

Test structures are presented for the evaluation of phase shift lithography on the gate level of a CMOS technology. The structures address the measurement of phase shift printed linewidth, the evaluation of transistors as a function of phase shifter geometry, and the detection of misalignment of contact windows to the phase shift printed gate.

Brittin C. Kane | R. A. Ashton | J. W. Blatchford | D. Shuttleworth

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