Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition
暂无分享,去创建一个
S. Schroeder | A. Gottwald | V. Beladiya | A. Szeghalmi | C. Mühlig | O. Stenzel | G. Matthäus | M. Trost | S. Wilbrandt | Pallabi Paul | F. Otto | Stefan Nolte | T. Fritz | Paul Schmitt | S. Riese | Shawon Alam | Gabor Matthaeus | Alexander Gottwald
[1] A. Tünnermann,et al. Influence of temperature and plasma parameters on the properties of PEALD HfO2 , 2021 .
[2] Md. Golam Hafiz,et al. Optical bandgap control in Al2O3/TiO2 heterostructures by plasma enhanced atomic layer deposition: Toward quantizing structures and tailored binary oxides. , 2021, Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy.
[3] P. Ma,et al. Atomic layer deposition of Al2O3 and HfO2 for high power laser application , 2020 .
[4] P. Ma,et al. The characterization and properties of mixed Sc2O3/SiO2 films , 2020 .
[5] B. Rus,et al. Femtosecond Laser-Induced Damage Characterization of Multilayer Dielectric Coatings , 2020, Coatings.
[6] G. Mannino,et al. Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers , 2020, Journal of Crystal Growth.
[7] Soon-Gil Yoon,et al. Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition , 2020, Materials.
[8] Nuo Xu,et al. Effects of water adsorption on properties of electron-beam HfO2/SiO2 high-reflection coatings , 2020 .
[9] Y. Alqaheem,et al. Microscopy and Spectroscopy Techniques for Characterization of Polymeric Membranes , 2020, Membranes.
[10] K. Kukli,et al. Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane , 2020, Nanotechnology.
[11] A. Tünnermann,et al. Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study. , 2020, Nanoscale.
[12] H. Kozuka,et al. In-plane stress development in sol–gel-derived titania and silica thin films on Si(100) substrates , 2019, Journal of Sol-Gel Science and Technology.
[13] D. Golosov,et al. Influence of film thickness on the dielectric characteristics of hafnium oxide layers , 2019, Thin Solid Films.
[14] L. Imhoff,et al. Curvature radius measurement by optical profiler and determination of the residual stress in thin films , 2019, Applied Surface Science.
[15] R. Buzelis,et al. High temperature annealing effects on spectral, microstructural and laser damage resistance properties of sputtered HfO2 and HfO2-SiO2 mixture-based UV mirrors , 2019, Optical Materials.
[16] A. Gottwald,et al. Validation of thin film TiO2 optical constants by reflectometry and ellipsometry in the VUV spectral range , 2019, Measurement Science and Technology.
[17] Jianda Shao,et al. Investigation on picosecond laser-induced damage in HfO2/SiO2 high-reflective coatings , 2018, Optics & Laser Technology.
[18] K. Kukli,et al. Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates , 2018 .
[19] P. Ma,et al. Enhanced thermomechanical stability on laser-induced damage by functionally graded layers in quasi-rugate filters , 2018 .
[20] P. Ma,et al. ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application , 2018 .
[21] Xiujian Chou,et al. Structural and Optical Properties of Amorphous Al2O3 Thin Film Deposited by Atomic Layer Deposition , 2018 .
[22] Lei Wang,et al. Effects of Bilayer Thickness on the Morphological, Optical, and Electrical Properties of Al2O3/ZnO Nanolaminates , 2017, Nanoscale Research Letters.
[23] A. Bananej,et al. Band gap energy and refractive index dependence of femtosecond laser induced damage threshold in dielectric thin films , 2017 .
[24] M. Ritala,et al. Studies on Thermal Atomic Layer Deposition of Silver Thin Films , 2017 .
[25] S. Junhong,et al. Influence of Substrate Surface Properties on Laser-induced Damage Properties of TiO2 Thin Films , 2016 .
[26] Yaowei Wei,et al. Optical and laser damage properties of HfO2/Al2O3 thin films deposited by atomic layer deposition , 2016 .
[27] Nabil Shovon Ashraf,et al. New Prospects of Integrating Low Substrate Temperatures with Scaling-Sustained Device Architectural Innovation , 2016, New Prospects of Integrating Low Substrate Temperatures with Scaling-Sustained Device Architectural Innovation.
[28] Umut T. Sanli,et al. Comparative study of ALD SiO 2 thin films for optical applications , 2016 .
[29] P. Souček,et al. Mechanical properties of atomic layer deposited Al2O3/ZnO nanolaminates , 2015 .
[30] A. Schwartzberg,et al. Complex Materials by Atomic Layer Deposition , 2015, Advanced materials.
[31] S. Vidya,et al. Optical properties of nanocrystalline HfO2 synthesized by an auto-igniting combustion synthesis , 2015 .
[32] C. Ramana,et al. Structure and optical properties of nanocrystalline hafnium oxide thin films , 2014 .
[33] H. Qi,et al. Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiation , 2014 .
[34] A. Besnard,et al. Stoney Formula: Investigation of Curvature Measurements by Optical Profilometer , 2014 .
[35] F. Piallat. Plasma assisted chemical deposi-tion (CVD/ALD) and integration of Ti(Al)N and Ta(Al)N for sub-20 nm metal gate , 2014 .
[36] Arunas Ramanavicius,et al. Tuning Optical Properties of Al2O3/ZnO Nanolaminates Synthesized by Atomic Layer Deposition , 2014 .
[37] X. Liu,et al. Rugate notch filter fabricated by atomic layer deposition. , 2014, Applied optics.
[38] L. Gallais,et al. Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs. , 2014, Applied optics.
[39] A. Tünnermann,et al. Roughness and optical losses of rugate coatings. , 2014, Applied optics.
[40] F. Krausz,et al. Optical breakdown of multilayer thin-films induced by ultrashort pulses at MHz repetition rates. , 2013, Optics express.
[41] K. Choy,et al. Fabrication of Multilayer ZnO/TiO2/ZnO Thin Films with Enhancement of Optical Properties by Atomic Layer Deposition (ALD) , 2013 .
[42] Jin-seong Park,et al. Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum , 2013 .
[43] P. Chalker,et al. Dielectric relaxation of high-k oxides , 2013, Nanoscale Research Letters.
[44] J. Talghader,et al. Continuous-wave laser damage of uniform and nanolaminate hafnia and titania optical coatings. , 2013, Optics letters.
[45] M. Fang,et al. Wide-angle and broadband graded-refractive-index antireflection coatings , 2013 .
[46] Laurent Gallais,et al. Laser damage resistance of ion-beam sputtered Sc2O3/SiO2 mixture optical coatings. , 2013, Applied optics.
[47] Michel Lequime,et al. Refractive index determination of SiO2 layer in the UV/Vis/NIR range: spectrophotometric reverse engineering on single and bi-layer designs , 2013 .
[48] Aurel Stratan,et al. Automated test station for laser-induced damage threshold measurements according to ISO 21254-1,2,3,4 standards , 2012, Laser Damage.
[49] R. Drazdys,et al. Investigation of the distribution of laser damage precursors at 1064 nm, 12 ns on niobia-silica and zirconia-silica mixtures. , 2012, Optics express.
[50] G. Wang,et al. Mechanism for atmosphere dependence of laser damage morphology in HfO2/SiO2 high reflective films , 2012 .
[51] M. Trubetskov,et al. Oscillations in spectral behavior of total losses (1 - R - T) in thin dielectric films. , 2012, Optics express.
[52] S. Kičas,et al. Femtosecond laser damage resistance of oxide and mixture oxide optical coatings. , 2012, Optics letters.
[53] Bernd Szyszka,et al. Atomic Layer Deposition , 2011 .
[54] G. Dingemans,et al. Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 , 2011 .
[55] G. DeBell,et al. Optical parameters of oxide films typically used in optical coating production. , 2011, Applied optics.
[56] Myriam Zerrad,et al. Laser-induced damage of hafnia coatings as a function of pulse duration in the femtosecond to nanosecond range. , 2011, Applied optics.
[57] Gerhard Ulm,et al. Ultraviolet and vacuum-ultraviolet detector-based radiometry at the Metrology Light Source , 2010 .
[58] A. Bananej,et al. The effect of porosity on the laser induced damage threshold of TiO2 and ZrO2 single layer films , 2010 .
[59] Christopher J. Stolz,et al. BDS thin film UV antireflection laser damage competition , 2010, Laser Damage.
[60] Holger Blaschke,et al. Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses , 2010, Laser Damage.
[61] N. Kamble,et al. Correlation between local structure and refractive index of e-beam evaporated (HfO2–SiO2) composite thin films , 2010 .
[62] Olaf Stenzel,et al. Realistische Modellierung der NIR/VIS/UV‐optischen Konstanten dünner optischer Schichten im Rahmen des Oszillatormodells , 2009 .
[63] W. Keuning,et al. Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films , 2009, ECS Transactions.
[64] G. Aygun,et al. Interfacial and structural properties of sputtered HfO2 layers , 2009 .
[65] Steve Hall,et al. Ellipsometric analysis of mixed metal oxides thin films , 2008 .
[66] M. Kordesch,et al. Amorphous hafnium oxide thin films for antireflection optical coatings , 2008 .
[67] F. Krausz,et al. Hafnium oxide thin films deposited by reactive middle-frequency dual-magnetron sputtering , 2007 .
[68] Jianda Shao,et al. Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector , 2007 .
[69] Satoshi Kamiyama,et al. Comparison between SiO2 films deposited by atomic layer deposition with SiH2[N(CH3)2]2 and SiH[N(CH3)2]3 precursors , 2006 .
[70] M. Liu,et al. Microstructure and interfacial properties of HfO2–Al2O3 nanolaminate films , 2006 .
[71] Steffen Wilbrandt,et al. New optimization algorithm for the synthesis of rugate optical coatings. , 2006, Applied optics.
[72] P. Evans,et al. Atomic layer deposition of TiO2 and Al2O3 thin films and nanolaminates , 2006 .
[73] Deane Chandler-Horowitz,et al. Sub-bandgap defect states in polycrystalline hafnium oxide and their suppression by admixture of silicon , 2005 .
[74] Tao Wang,et al. Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings , 2005 .
[75] Martin L. Green,et al. Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films , 2005 .
[76] M. Al-Kuhaili. Optical properties of hafnium oxide thin films and their application in energy-efficient windows , 2004 .
[77] J. Robertson. High dielectric constant oxides , 2004 .
[78] J. Aarik,et al. Optical characterization of HfO2 thin films grown by atomic layer deposition , 2004 .
[79] Jianda Shao,et al. Roles of absorbing defects and structural defects in multilayer under single-shot and multi-shot laser radiation , 2004 .
[80] Hagen Bartzsch,et al. Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering , 2004 .
[81] Eduard A. Cartier,et al. Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition , 2001 .
[82] S. Thakur,et al. Laser-induced damage threshold study on TiO2/SiO2 multilayer reflective coatings , 2019, Indian Journal of Physics.
[83] Hao Liu. Atomic layer deposition for high power laser applications: Al2O3 and HfO2 , 2018 .
[84] M. Vargas. Nanometric structure-property relationship in hafnium oxide thin films made by sputter-deposition , 2014 .
[85] J. Oliver. Evaporated HfO2/SiO2 Optical Coatings and Modifications for High-Power Laser Applications , 2012 .
[86] M. Ritala,et al. Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study , 2012 .
[87] van Erj Erik Beekum. PEALD and PECVD inorganic layers:microstructure characterization and moisture permeation barrier properties , 2012 .
[88] Claude Amra,et al. High-reflectivity HfO2/SiO2 ultraviolet mirrors. , 2002, Applied optics.