Exposure Time Variation Method Using DMD for Microstereolithography
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In-Hwan Lee | T. Ko | I. Lee | Ho-Chan Kim | Tae-Jo Ko | Ho-chan Kim | Hae-Ryong Yoon | Haelim Yoon
[1] K. Ikuta,et al. Submicron stereolithography for the production of freely movable mechanisms by using single-photon polymerization , 2002 .
[2] Ho-Chan Kim,et al. Reduction of post-processing for stereolithography systems by fabrication-direction optimization , 2005, Comput. Aided Des..
[3] Larry J. Hornbeck,et al. Digital Light Processing and MEMS: Timely Convergence for a Bright Future , 2002 .
[4] Ho-Chan Kim,et al. STL file generation from measured point data by segmentation and Delaunay triangulation , 2002, Comput. Aided Des..
[5] Seok-Hee Lee,et al. Fabrication of a micro-lens array with a nonlayered method in projection microstereolithography , 2010 .
[6] Jesse Hanssen,et al. Rapid Prototyping in Manufacturing , 2013 .
[7] Paul S. Heckbert,et al. Creating Raster Omnimax Images from Multiple Perspective Views Using the Elliptical Weighted Average Filter , 1986, IEEE Computer Graphics and Applications.
[8] Paul Xirouchakis,et al. STL and extensions , 2000 .
[9] Dong-Woo Cho,et al. Micro-stereolithography photopolymer solidification patterns for various laser beam exposure conditions , 2003 .
[10] Andreas Gebhardt,et al. Rapid prototyping , 2003 .
[11] Nicholas X. Fang,et al. Projection micro-stereolithography using digital micro-mirror dynamic mask , 2005 .
[12] In-Baek Park,et al. Three-dimensional microstructure using partitioned cross-sections in projection microstereolithography , 2010 .