Microfluidic systems with on-line UV detection fabricated in photodefinable epoxy

This paper describes a method for fabricating microfluidic devices in a photodefinable epoxy (SU-8). This technique is compatible with, and complementary to, conventional fabrication techniques. It allows microstructures formed in SU-8 to be bonded to produce sealed microfluidic channels. A micromixer fabricated entirely in SU-8, using this technique, for performing liquid-phase reactions is shown to be suitable for visible spectroscopy. This fabrication method also allows the incorporation of materials that are often difficult to integrate. By fabricating hybrid devices that incorporate quartz windows, we demonstrate that these devices are compatible with organic solvents and that in situ ultraviolet detection in a microfluidic system is possible.

[1]  George M. Whitesides,et al.  Rapid prototyping of complex structures with feature sizes larger than 20 μm , 1996 .

[2]  Michael P. Harold,et al.  Micromachined reactors for catalytic partial oxidation reactions , 1997 .

[3]  R. McCormick,et al.  Microchannel electrophoretic separations of DNA in injection-molded plastic substrates. , 1997, Analytical chemistry.

[4]  Klavs F. Jensen,et al.  Microchemical systems: Status, challenges, and opportunities , 1999 .

[5]  Peter Vettiger,et al.  High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS , 1998 .

[6]  Andreas Manz,et al.  Towards Organic Synthesis in Microfluidic Devices: Multicomponent Reactions for the Construction of Compound Libraries , 2000 .

[7]  Richard D. Rabbitt,et al.  Electric impedance spectroscopy using microchannels with integrated metal electrodes , 1999 .

[8]  L.J. Guerin,et al.  Simple and low cost fabrication of embedded micro-channels by using a new thick-film photoplastic , 1997, Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97).

[9]  Martin A. Schmidt,et al.  Influence of Coil Power on the Etching Characteristics in a High Density Plasma Etcher , 1999 .

[10]  P. Vettiger,et al.  High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications , 1997, Proceedings IEEE The Tenth Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots.

[11]  Klavs F. Jensen,et al.  Novel Liquid Phase Microreactors for Safe Production of Hazardous Specialty Chemicals , 2000 .

[12]  Pasqualina M. Sarro,et al.  Low-temperature quartz-to-silicon bonding for SAW applications , 1998, Smart Structures.

[13]  W. Menz.  LIGA and related technologies for industrial application , 1996 .

[14]  G. Whitesides,et al.  Rapid Prototyping of Microfluidic Systems in Poly(dimethylsiloxane). , 1998, Analytical chemistry.

[15]  Steven J. Holmes,et al.  Negative photoresists for optical lithography , 1997, IBM J. Res. Dev..

[16]  M. Despont,et al.  SU-8: a low-cost negative resist for MEMS , 1997 .

[17]  Daniel Bertrand,et al.  Buried microchannels in photopolymer for delivering of solutions to neurons in a network , 1998 .

[18]  Milena Koudelka-Hep,et al.  Microreactor and electrochemical detectors fabricated using Si and EPON SU-8 , 2000 .

[19]  Xu,et al.  Room-temperature imprinting method for plastic microchannel fabrication , 2000, Analytical chemistry.