Post-routing layer assignment for double patterning with timing critical paths consideration
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Yinghai Lu | Hai Zhou | Xuan Zeng | Jian Sun | Changhao Yan
[1] Ting-Chi Wang,et al. Robust layer assignment for via optimization in multi-layer global routing , 2009, ISPD '09.
[2] Jason Cong,et al. An efficient approach to multilayer layer assignment with anapplication to via minimization , 1999, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..
[3] David Hung-Chang Du,et al. Layer Assignment Problem for Three-Layer Routing , 1988, IEEE Trans. Computers.
[4] Kun Yuan,et al. Double patterning lithography friendly detailed routing with redundant via consideration , 2009, 2009 46th ACM/IEEE Design Automation Conference.
[5] Yinghai Lu,et al. Post-routing layer assignment for double patterning , 2011, 16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011).
[6] Mihalis Yannakakis,et al. Node-and edge-deletion NP-complete problems , 1978, STOC.
[7] David Z. Pan,et al. Double patterning technology friendly detailed routing , 2008, ICCAD 2008.
[8] R. Pinter. Optimal layer assignment for interconnect , 1984 .
[9] T.-C. Wang,et al. Congestion-Constrained Layer Assignment for Via Minimization in Global Routing , 2008, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[10] D Josep. Max-Cut and Max-Bisection are NP-hard on unit disk graphs , 2006 .
[11] Andrew B. Kahng,et al. Layout decomposition for double patterning lithography , 2008, 2008 IEEE/ACM International Conference on Computer-Aided Design.
[12] Andrew B. Kahng,et al. Layout Decomposition Approaches for Double Patterning Lithography , 2010, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[13] Yue Xu,et al. GREMA: Graph reduction based efficient mask assignment for double patterning technology , 2009, 2009 IEEE/ACM International Conference on Computer-Aided Design - Digest of Technical Papers.
[14] Yue Xu,et al. A matching based decomposer for double patterning lithography , 2010, ISPD '10.