Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy
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Young-Keun Kim | Byung-Gook Kim | Chan-Uk Jeon | Minwook Kang | Jae W. Hahn | Il-Yong Jang | Changmin Lee | Junhwa Jung
[1] Changhoon Oh,et al. Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma. , 2010, The Review of scientific instruments.
[2] Vincent M. Donnelly,et al. Electron temperatures of inductively coupled Cl2-Ar plasmas , 2002 .
[3] Eray S. Aydil,et al. Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor , 2002 .
[4] Vincent M. Donnelly,et al. Optical actinometry of Cl2, Cl, Cl+, and Ar+ densities in inductively coupled Cl2–Ar plasmas , 2001 .
[5] U. Czarnetzki,et al. Plasma diagnostics by optical emission spectroscopy on argon and comparison with Thomson scattering , 2009 .
[6] Noah Hershkowitz,et al. Diagnostics for plasma processing (etching plasmas) (invited) , 1997 .
[7] Jae Won Hahn,et al. Improvement in photomask critical dimension uniformity using etch selectivity control , 2016 .
[8] Liudi Jiang,et al. Dry etching of SiC in inductively coupled Cl2/Ar plasma , 2004 .