Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology.
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K. Goldberg | J. Underwood | P. Naulleau | P. Batson | K A Goldberg | S Jeong | P P Naulleau | P J Batson | J H Underwood | S. Jeong
[1] Donald M. Tennant,et al. Alignment of a multilayer‐coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing , 1995 .
[2] Eric M. Gullikson. Scattering from normal-incidence EUV optics , 1998, Advanced Lithography.
[3] J. H. Underwood,et al. Generation of a parallel X-ray beam and its use for testing collimators , 1977 .
[4] Kenneth A. Goldberg,et al. Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions , 1999 .
[5] A. A. MacDowell,et al. Phase‐measuring interferometry using extreme ultraviolet radiation , 1995 .
[6] J. Bokor,et al. Phase-shifting point diffraction interferometer. , 1996, Optics letters.
[7] J. Underwood,et al. Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance. , 1981, Applied optics.
[8] R. H. Stulen,et al. Extreme ultraviolet lithography , 1999 .
[9] H. Padmore,et al. Theory and practice of elliptically bent x-ray mirrors , 2000 .
[10] M. Howells,et al. Design considerations for adjustable-curvature, high-power, x-ray mirrors based on elastic bending , 1993 .
[11] N. Ceglio,et al. Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography. , 1993, Applied optics.
[12] Eric M. Gullikson,et al. Beamline for measurement and characterization of multilayer optics for EUV lithography , 1998, Advanced Lithography.
[13] Franco Cerrina,et al. SHADOW: A synchrotron radiation ray tracing program , 1986 .
[14] Jeffrey Bokor,et al. Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks , 1999 .
[15] J. Bokor,et al. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems. , 2000, Applied optics.
[16] Kenneth A. Goldberg,et al. Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry , 1997, Advanced Lithography.
[17] P. Kirkpatrick,et al. Formation of optical images by X-rays. , 1948, Journal of the Optical Society of America.
[18] W. Ehrenberg,et al. X-ray optics; the production of converging beams by total reflection. , 1949, Journal of the Optical Society of America.