论文信息 - Comparison of Microwave ECR and RF Plasmas for Dry Etching of Single Crystal 6H-SiC - 字舞流文

Comparison of Microwave ECR and RF Plasmas for Dry Etching of Single Crystal 6H-SiC

Jian H. Zhao | M. Dubey | G. Mclane | J. Flemish | L. Casas | W. Buchwald | K. Xie

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