무전극 형광램프의 페라이트 특성변화 시뮬레이션을 통한 전자계 분포

The RF inductive discharge of inductively couples plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. Although most practical ICPs operate at 13.56 [㎒] and 2.65 [㎒], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. in and electrodeless fluorescent lamp, the lise of a lower operating frequency simplifies and reduces cost of RF matching systems and RF generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, electric and optical characteristics of electrodeless fluorescent lamp by changing ferrite position is discussed.