论文信息 - Oxidation of Single Crystalline Ti2AlN Thin Films between 300 and 900 °C: A Perspective from Surface Analysis - 字舞流文

Oxidation of Single Crystalline Ti2AlN Thin Films between 300 and 900 °C: A Perspective from Surface Analysis

Jisheng Pan | L. Wong | J. Chai | Zheng Zhang | Shijie Wang | S. Lim | Hongmei Jin | M. Sullivan | Shijie Wang