论文信息 - The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor.

The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor.

Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD.

M. A. Malik | P. O’Brien | M. Helliwell | M. Afzaal | A. Panneerselvam

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