AlGaN/GaN Metal-Insulator-Semiconductor High Electron-Mobility Transistor Using a NbAlO/Al2O3 Laminated Dielectric by Atomic Layer Deposition
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Lin-An Yang | Y. Hao | Xiao-hua Ma | Q. Feng | Jincheng Zhang | Kai Zhang | Wei Mao | Yong-Ming Chang | Zhi-wei Bi | Zhi-Yuan Gao | Hong-xia Liu | Nan Mei | Zhi-yuan Gao