论文信息 - A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors - 字舞流文

A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors

C. Hwang | S. Hyun | M. Park | T. Moon | H. Park | Young Hwan Lee | Yong Bin Lee | Baek Su Kim | B. Kim | Keum Do Kim | Jangho Roh | Ho Hyun Kim | B. Kim | Y. Lee | H. Kim