论文信息 - New plasma source with an UHF (500 MHz) antenna - 字舞流文

New plasma source with an UHF (500 MHz) antenna

S. Samukawa | T. Tsukada | Y. Nakagawa | H. Ueyama | K. Shinohara

[1] S. Samukawa,et al. New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes , 1995 .

[2] S. Samukawa,et al. Low‐temperature, uniform, and high‐density plasma produced by a new ultra‐high‐frequency discharge with a spokewise antenna , 1995 .

[3] H. Nogami,et al. Etching Characteristics by M= 0 Helicon Wave Plasma , 1994 .