Semiconductor manufacturing process control and monitoring: A fab-wide framework
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S. Joe Qin | Jin Wang | Richard Good | Gregory A. Cherry | Christopher A. Harrison | S. Qin | G. Cherry | R. Good | Jin Wang | Christopher A. Harrison | S. Qin
[1] S.J. Qin,et al. Multiblock principal component analysis based on a combined index for semiconductor fault detection and diagnosis , 2006, IEEE Transactions on Semiconductor Manufacturing.
[2] R.P. Good,et al. On the stability of MIMO EWMA run-to-run controllers with metrology delay , 2006, IEEE Transactions on Semiconductor Manufacturing.
[3] S.J. Qin,et al. Recursive least squares estimation for run-to-run control with metrology delay and its application to STI etch process , 2005, IEEE Transactions on Semiconductor Manufacturing.
[4] S. Qin,et al. Fault Diagnosis in the Feedback-Invariant Subspace of Closed-Loop Systems , 2005 .
[5] Ioannis G. Kevrekidis,et al. Equation-free: The computer-aided analysis of complex multiscale systems , 2004 .
[6] C.A. Harrison,et al. A multi-step supervisory control strategy for semiconductor device manufacturing , 2004, 2004 43rd IEEE Conference on Decision and Control (CDC) (IEEE Cat. No.04CH37601).
[7] S. Joe Qin,et al. Statistical process monitoring: basics and beyond , 2003 .
[8] Karl G. Kempf,et al. A hierarchical approach to production control of reentrant semiconductor manufacturing lines , 2003, IEEE Trans. Control. Syst. Technol..
[9] S. Joe Qin,et al. A survey of industrial model predictive control technology , 2003 .
[10] Karl G. Kempf,et al. A Model Predictive Control framework for robust management of multi-product, multi-echelon demand networks , 2003, Annu. Rev. Control..
[11] Enrique Del Castillo,et al. A multivariate double EWMA process adjustment scheme for drifting processes , 2002, IIE Transactions.
[12] S. Tseng,et al. A study on a multivariate EWMA controller , 2002 .
[13] S. J. Qin,et al. Stability analysis of double EWMA run-to-run control with metrology delay , 2002, Proceedings of the 2002 American Control Conference (IEEE Cat. No.CH37301).
[14] S. Joe Qin,et al. Reconstruction-Based Fault Identification Using a Combined Index , 2001 .
[15] R. Schaller,et al. Technological innovation in the semiconductor industry: A case study of the International Technology Roadmap for Semiconductors (ITRS) , 2001, PICMET '01. Portland International Conference on Management of Engineering and Technology. Proceedings Vol.1: Book of Summaries (IEEE Cat. No.01CH37199).
[16] Ruey-Shan Guo,et al. Age-based double EWMA controller and its application to CMP processes , 2001 .
[17] H. Yue,et al. Plasma etching endpoint detection using multiple wavelengths for small open-area wafers , 2001 .
[18] Daniel E. Rivera,et al. Multilayer optimization and scheduling using model predictive control: application to reentrant semiconductor manufacturing lines , 2000 .
[19] H. Yue,et al. Fault detection of plasma etchers using optical emission spectra , 2000 .
[20] S. Adivikolanu,et al. Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure , 2000 .
[21] Thomas F. Edgar,et al. Model-based control in microelectronics manufacturing , 1999, Proceedings of the 38th IEEE Conference on Decision and Control (Cat. No.99CH36304).
[22] Pramod P. Khargonekar,et al. A probabilistic approach to run-to-run control , 1998 .
[23] S. Joe Qin,et al. Determining the number of principal components for best reconstruction , 1998 .
[24] Jinn-Yi Yeh,et al. An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes , 1998, ICMTS 1998.
[25] V. Bakshi. Benchmarking of commercial software for fault detection and classification (FDC) of plasma etchers for semiconductor manufacturing equipment , 1997, Proceedings of the 1997 American Control Conference (Cat. No.97CH36041).
[26] Arnon M. Hurwitz,et al. Run-to-Run Process Control: Literature Review and Extensions , 1997 .
[27] J. S. Baras,et al. Designing response surface model-based run-by-run controllers: a worst case approach , 1996 .
[28] Duane S. Boning,et al. Run by run control of chemical-mechanical polishing , 1995, Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'.
[29] Costas J. Spanos,et al. Prediction of wafer state after plasma processing using real-time tool data , 1995 .
[30] Barry M. Wise,et al. The process chemometrics approach to process monitoring and fault detection , 1995 .
[31] John F. MacGregor,et al. Multivariate SPC charts for monitoring batch processes , 1995 .
[32] Armann Ingolfsson,et al. Run by run process control: combining SPC and feedback control , 1995 .
[33] S. W. Butler,et al. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry , 1994 .
[34] Theodora Kourti,et al. Statistical Process Control of Multivariate Processes , 1994 .
[35] Armann Ingolfsson,et al. Stability and Sensitivity of an EWMA Controller , 1993 .
[36] Armann Ingolfsson,et al. Modeling and control of an epitaxial silicon deposition process with step disturbances , 1991, [1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop.
[37] C. Spanos,et al. Statistical experimental design in plasma etch modeling , 1991 .
[38] J. Edward Jackson,et al. A User's Guide to Principal Components. , 1991 .
[39] Karl Johan Åström,et al. Adaptive Control , 1989, Embedded Digital Control with Microcontrollers.
[40] Lennart Ljung,et al. System Identification: Theory for the User , 1987 .
[41] Johannes Ledolter,et al. Statistical methods for forecasting , 1983 .