Equilibrium water uptake and diffusion behavior in model polynorbornene photoresist polymers
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[1] Alan Townshend,et al. Applications of piezoelectric quartz crystal microbalances , 1987 .
[2] Clifford L. Henderson,et al. Dissolution behavior of bis-trifluoromethyl-carbinol-substituted polynorbornenes , 2003, SPIE Advanced Lithography.
[3] Chris A. Mack,et al. Diffusivity measurements in polymers: IV. Acid diffusion in chemically amplified resists , 1997, Advanced Lithography.
[4] Broderick R. Wilks,et al. Free volume and free volume distribution impact on transport properties in amorphous glassy polymers , 2002 .
[5] S. Gellman,et al. Evaluation of hydrogen bonding complementarity between a secondary sulfonamide and an alpha-amino acid residue. , 2001, Organic letters.
[6] Won Jae Chung. Molecular modeling of structure-property relationship for palladium catalyzed poly(norbornene) and it derivatives , 2003 .
[7] John C. Huffman,et al. Addition Polymerization of Norbornene-Type Monomers. High Activity Cationic Allyl Palladium Catalysts , 2002 .
[8] J. Comyn,et al. Introduction to Polymer Permeability and the Mathematics of Diffusion , 1985 .
[9] Wolf R. Vieth,et al. Diffusion in and Through Polymers: Principles and Applications , 1991 .
[10] J. L. Duda,et al. Diffusion in polymer‐solvent systems , 2007 .
[11] M. Switkes,et al. Immersion lithography at 157 nm , 2001 .
[12] Will Conley,et al. Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results , 2002 .
[13] Ryan Deschner,et al. Implications of immersion lithography on 193-nm photoresists , 2004, SPIE Advanced Lithography.
[14] C. Henderson,et al. The effect of humidity on water sorption in photoresist polymer thin films , 2003 .
[15] Ankur Agrawal,et al. Bis(trifluoromethyl)carbinol-Substituted Polynorbornenes: Dissolution Behavior , 2004 .