论文信息 - The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices - 字舞流文

The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices

Jianfeng Gao | Jinbiao Liu | Junfeng Li | Tao Yang | Wenwu Wang | Junjie Li | Hao Liu | J. Xiang | H. Mao | N. Zhou | Meng Shi | Yanpeng Hu | Jiaxin Ju | Yuxiao Lei | Junjie Li | Y. Lei