Micrograting device using electron-beam lithography

Recent trends in laser application systems such as optical information systems, optical network systems, and optical measurement systems have presented a need for small size, light weight, low cost, and mass productivity. Advantages of a micro grating device in laser beam application systems are high integration capability, design flexibility, and mass productivity. In this paper, recent investigations of the micro gating devices using electron-beam lithography are described, with emphasis on clarifying both their uses and fundamental optical characteristics.