Excimer laser ablation of microstructures: A numerical model

A new model for the ablation of microstructures with excimer laser radiation is presented. The model is based on an interactive two-step approach. The local distribution of the light over the developing structure is evaluated for each pulse. This distribution is then used to calculate the local etch rate, and hence the change to the structure. Despite the assumptions inherent in the model, in particular assumptions made about the propagation of the light through a developing structure and about the etching behavior of the materials, results from the model agree with actual aspects of ablated structures. The model has been used with some success to predict the wall angles of trench structures ablated using partially coherent illumination from a fly’s eye homogenizer. Predictions of the model show good agreement with the experiment results. In particular, the model correctly predicts the variation of the wall angles with incident fluence and also predicts structures with well defined wall angles over depths much greater than the depth of focus of the image. © 1999 American Institute of Physics.@S0021-8979~99!08522-9#

[1]  Peter E. Dyer,et al.  Excimer laser ablation for micro-machining : geometric effects , 1996 .

[2]  Berthold Burghardt,et al.  Excimer laser illumination and imaging optics for controlled microstructure generation , 1993, Other Conferences.

[3]  R. Sauerbrey,et al.  Pulsed ultraviolet laser ablation , 1993 .

[4]  S. Namba,et al.  Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser , 1982 .

[5]  Emil Wolf,et al.  Principles of Optics: Contents , 1999 .

[6]  R. Srinivasan,et al.  Laser ablation of organic polymers: Microscopic models for photochemical and thermal processes , 1985 .

[7]  P. J. Oakley,et al.  Laser Processing in Manufacturing , 1992 .

[8]  T. W. Hodapp,et al.  Modeling topology formation during laser ablation , 1998 .

[9]  R. Srinivasan,et al.  Dynamics of UV laser ablation of organic polymer surfaces , 1986 .

[10]  G. Arthur,et al.  Deep UV optics for excimer laser systems , 1990 .

[11]  Stephen R. Cain,et al.  Photothermal description of polymer ablation: Absorption behavior and degradation time scales , 1992 .

[12]  J. Lankard,et al.  Excimer laser ablation of polyimide in a manufacturing facility , 1992 .

[13]  A. S. Holmes,et al.  The formation of moulds for 3D microstructures using excimer laser ablation , 1996 .

[14]  P. H. Key,et al.  Direct etching of polymeric materials using a XeCl laser , 1983 .

[15]  R. Srinivasan,et al.  Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiation , 1982 .

[16]  Andrew S. Holmes,et al.  Laminated dry film resist for microengineering applications , 1996 .

[17]  K. Hesch,et al.  Combination of excimer laser micromachining and replication processes suited for large scale production , 1995 .

[18]  Donald L. Singleton,et al.  Excimer lasers in cardiovascular surgery: Ablation products and photoacoustic spectrum of the arterial wall , 1986 .

[19]  J. Goodman Introduction to Fourier optics , 1969 .

[20]  C. Otis,et al.  On single‐photon ultraviolet ablation of polymeric materials , 1992 .

[21]  R. Srinivasan,et al.  Theory of etching of polymers by far-ultraviolet high-intensity pulsed laser- and long-term irradiation , 1984 .

[22]  S. Trokel,et al.  Excimer laser surgery of the cornea. , 1983, American journal of ophthalmology.

[23]  Thomas K. Gaylord,et al.  Rigorous electromagnetic analysis of diffraction by finite-number-of-periods gratings , 1997 .

[24]  Ronald Pethig,et al.  Development of biofactory-on-a-chip technology using excimer laser micromachining , 1998 .

[25]  M Izutsu,et al.  Beam propagation method analysis of optical waveguide lenses. , 1990, Applied optics.

[26]  S. Babu,et al.  Heat transfer and material removal in pulsed excimer‐laser‐induced ablation: Pulsewidth dependence , 1994 .

[27]  M. Stuke,et al.  Femtosecond uv excimer laser ablation , 1987 .

[28]  S. D. Jenkins,et al.  Development and origin of conical structures on XeCl laser ablated polyimide , 1986 .

[29]  James Hammond Brannon,et al.  Threshold behavior in polyimide photoablation: Single-shot rate measurements and surface-temperature modeling , 1993 .

[30]  L. Paratte,et al.  Low-cost technology for multilayer electroplated parts using laminated dry film resist , 1996 .