On board polarization measuring instrument for high NA excimer scanner

We developed an instrument for monitoring the polarized illuminator of the ArF scanner. A rotatable retarder and a rotatable analyzer were incorporated in the instrument for polarimetry. The instrument measures polarization state of the polarized illuminator in sufficient accuracy. Stokes parameter of the illumination light incorporated in the ArF scanner was successfully obtained. The measured result showed that the polarization state of the illumination light was controlled well. The instrument is as small and light-weighted as can be installed on board.

[1]  L. W. Chubb,et al.  Polarized Light , 2019, Light Science.

[2]  Toru Fujii,et al.  Portable phase measuring interferometer using Shack-Hartmann method , 2003, SPIE Advanced Lithography.

[3]  Bruce W. Smith,et al.  Challenges in high NA, polarization, and photoresists , 2002, SPIE Advanced Lithography.

[4]  Tomoyuki Matsuyama,et al.  Study of high NA imaging with polarized illumination , 2004, SPIE Advanced Lithography.

[5]  Martha I. Sanchez,et al.  High-NA lithographic imagery at Brewster's angle , 2002, SPIE Advanced Lithography.

[6]  Yuuki Ishii,et al.  Full-field exposure tools for immersion lithography , 2004, SPIE Advanced Lithography.

[7]  Noriaki Tokuda,et al.  Development of polarized-light illuminator and its impact , 2004, SPIE Advanced Lithography.