论文信息 - Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-produced Sn plasmas

Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-produced Sn plasmas

Temporally resolved imaging of 13.5 nm extreme ultraviolet (EUV) emission from laser-produced Sn plasmas was experimentally investigated with a monochromatic EUV imager. Absorption caused by the surrounding plasma was eliminated by adopting a stripe Sn target laminated on a plastic film so that the CH plasma tamped lateral expansion of the Sn plasma. The experimental results revealed that reabsorption induced by plasma, both in EUV emission-dominant and long scale coronal regions, plays an key role in extracting the EUV light from the plasma efficiently.

[1] Hiroaki Nishimura,et al. Temporally resolved Schwarzschild microscope for the characterization of extreme ultraviolet emission in laser-produced plasmas , 2004 .

[2] Hiroaki Nishimura,et al. Target fabrication of low-density and nanoporous tin oxide as laser targets to generate extreme ultraviolet , 2005, SPIE Advanced Lithography.

[3] Hiroaki Nishimura,et al. Characterization of density profile of laser-produced Sn plasma for 13.5nm extreme ultraviolet source , 2005 .

[4] Luke McKinney,et al. Variable composition laser-produced Sn plasmas—a study of their time-independent ion distributions , 2004 .

[5] C. Cerjan,et al. Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime , 1996 .

[6] Hiroaki Nishimura,et al. Monochromatic imaging and angular distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas , 2004 .

[7] Shinsuke Fujioka,et al. Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams , 2005 .

[8] Martin Richardson,et al. High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography , 2004 .