Surface analysis of the chemical polishing process using a fullerenol slurry by Raman spectroscopy under surface plasmon excitation
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Yasuhiro Takaya | Terutake Hayashi | Masaki Michihata | Ryota Murai | R. Murai | Y. Takaya | M. Michihata | Terutake Hayashi | Kazumasa Kano | Kazumasa Kano
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